Cleaner for photolithography process
Possible to remove scum that adheres to the inside of the dry film resist/stripping equipment or solder resist developing equipment such as spray nozzle, conveyor roller etc.
DFR developing tank：ADEKA TEC ND-431(E)
DFR stripping tank：ADEKA TEC ND-420
Applications
DFR developing tank cleaning
DFR stripping tank cleaning
Features
- The solvent components' penetration power disperses and solubilizes scum
- Neutralizes inorganic salts and prevents scum aggregation
- Not damage equipment such as PVC
- Has more than three times the dissolving power of other companies’ products and can be used repeatedly until it no longer dissolves (ND-431(E))
PSR developing tank：ADEKA TEC ND-450SR
Applications
PSR developing tank cleaning
Features
- The solvent components swell the scum
- The cleaning effect is further enhanced by performing HCl cleaning as a post-treatment
