Photomasks related etchant
MoSi can be removed simply by dipping it in our MoSi etchant. It is possible to reduce physical polishing when reworking mask blanks. It is a hydrogen peroxide-based solution, a one-liquid type that is easy to use, highly stable, and can be used with PVC equipment. It can also be used for pattern formation on photomasks.
MoSi etchant：ADEKA CHELUMICA WGM series
Applications
Mask Blanks, Photomasks (Pattern formation)
Features
- Glass corrosion suppression
- Etching rate can be controlled by temperature
